釹鐵硼薄膜是一種非常有吸引力的材料，適用於光電工程和電子學，以及需要高矯頑力、高剩磁和高可見光透射率的高科技設備。本研究使用直流濺射將退火後的 Ti/NdFeB/Ti 薄膜與聚甲基丙烯酸甲酯板材複合，經過 20 次反覆熱壓摺疊，再經過噴砂和熱壓得到大面積的聚甲基丙烯酸甲酯/Ti/ NdFeB/Ti顆粒型片狀複合材料，並研究該複合材料的磁性及光學性質。通過UV-Vis透光率量測和SQUID磁性量測，我們發現該複合材料在可見光範圍內具有約65%的透光率，在平行及垂直薄膜方向的飽和磁化強度和矯頑力分別為21.3 emu/cm3、307.8 Oe及28.3 emu/cm3、366 Oe，該複合材料具有可塑性，可加工成曲面的透明磁性板材。

NdFeB thin film is a very attractive material for applications in optical-electrical engineering and in electronics, for hightech devices where high coercive field, high remanence and high visible light transmittance are needed.In this study, DC sputtering was used to composite the annealed Ti/NdFeB/Ti film with the polymethyl methacrylate sheet, and after 20 times of repeated hot pressing and folding, then sandblasting and hot pressing to obtain a large area of polymethyl methacrylate /Ti/NdFeB/Ti granular flake composite material, and study the magnetic and optical properties of the composite material. Through UV-Vis transmittance measurement and SQUID magnetic measurement, we found that the composite material has a transmittance of about 65% in the visible light range, and the saturation magnetization and coercivity in the parallel and perpendicular directions of the film are 21.3 emu/cm3, 307.8 Oe and 28.3 emu/cm3, 366 Oe, respectively. The composite material has plasticity and can be processed into curved transparent magnetic plates.

第一章	緒論.....1
1.1.	前言.....1
1.2.	研究動機與目的.....6
第二章	文獻回顧與理論基礎.....8
2.1.	文獻回顧.....8
2.1.1.	透明磁性薄膜.....8
2.1.2.	NdFeB磁性薄膜.....11
2.1.2.1.	NdFeB薄膜製作方式.....11
2.1.2.2.	緩衝層對NdFeB薄膜磁性的影響.....12
2.1.2.3.	NdFeB薄膜不同組成比的磁性能.....14
2.1.2.4.	NdFeB膜厚對磁性能的影響.....15
2.1.2.5.	NdFeB多層膜之磁性能.....17
2.1.2.6.	退火後的結構及磁性能.....19
2.1.3.	磁性薄膜的光學性質.....21
2.1.4.	磁性薄膜的機械性能.....22
2.2.	理論基礎.....23
2.2.1.	磁性物質簡介.....23
2.2.2.	磁域(Magnetic domain).....24
2.2.3.	磁滯現象(Hysteresis).....25
2.2.4.	磁異向性(Magnetic anisotropy).....26
2.2.5.	磁壁釘扎(Domain wall pinning).....26
2.2.6.	米氏散射理論.....28
第三章	實驗方法與薄膜分析設備.....29
3.1.	實驗流程圖.....29
3.2.	樣品製備.....30
3.2.1.	實驗材料.....30
3.2.2.	實驗設備.....34
3.2.3.	NdFeB薄膜濺鍍.....39
3.2.4.	NdFeB薄膜退火處理.....41
3.2.5.	透明磁性薄膜的製備與性質分析.....43
3.3.	薄膜性質量測分析設備.....51
3.3.1.	NdFeB磁鐵元素分析.....51
3.3.2.	膜厚量測.....53
3.3.3.	晶體結構分析.....54
3.3.4.	表面形貌分析.....55
3.3.5.	磁性量測.....56
3.3.6.	光學性質分析.....57
第四章	結果與討論.....58
4.1.	Ti/NdFeB/Ti薄膜性質分析.....58
4.1.1.	晶體結構分析.....58
4.1.2.	微結構分析.....61
4.1.3.	磁性分析.....66
4.2.	PMMA/Ti/NdFeB/Ti薄膜顆粒複合材料性質分析.....69
4.2.1.	微結構分析.....69
4.2.2.	光學分析.....71
4.2.3.	磁性分析.....72
第五章	結論與未來展望.....75
第六章	參考文獻.....76
 
圖目錄
圖1-1  向量磁光磁力計[4].....2
圖1-2  半透明磁性薄膜應用[11].....3
圖1-3  STO/MgO/ITO n/p/n 結構的 I-V 特性[17].....4
圖2-1  不同厚度的ZAO-Fe3O4膜在室溫下的磁滯曲線 [27].....10
圖2-2  不同Ti緩衝層厚度的磁滯曲線[55].....13
圖2-3  不同厚度NdFeB薄膜的矩形比(S=Mr/Ms)[59].....16
圖2-4  不同厚度NdFeB薄膜的矯頑力[59].....16
圖2-5  不同厚度的單層和多層膜面外磁滯曲線[61].....18
圖2-6  (a)燒結磁體和(b)最佳退火磁體的微觀結構示意圖[67].....19
圖2-7  鐵磁性物質之磁域結構[71].....24
圖2-8  磁滯曲線[71].....26
圖2-9  條紋幾何中兩個磁疇之間的Bloch wall中磁化旋轉的示意圖.....27
圖2-10  磁化強度(J)或磁通量密度(B)隨鐵磁材料中磁場強度(H)的變化而變化.....27
圖3-1  實驗流程圖.....29
圖3-2  燒結NdFeB磁鐵.....31
圖3-3  鈦靶.....31
圖3-4  高密度石墨板.....32
圖3-5  高壓除塵空氣罐.....33
圖3-6  耐高溫密封膠.....33
圖3-7  烘箱.....35
圖3-8  拋光機.....36
圖3-9  超音波清洗機.....36
圖3-10  真空濺鍍機.....37
圖3-11  真空高溫爐.....37
圖3-12  共軛焦雷射掃描顯微鏡.....38
圖3-13  熱壓機(由液壓機自行改裝).....38
圖3-14  耐熱膠帶蓋住一半Si基板.....40
圖3-15  沉積在(a)Si基板、(b)石墨板的Ti/ NdFB /Ti薄膜.....40
圖3-16  包埋法退火示意圖.....42
圖3-17  退火歷程.....42
圖3-18  退火後的Ti/ NdFB /Ti 薄膜在(a)Si基板、(b)石墨板上.....42
圖3-19  透明磁性薄膜的製作.....44
圖3-20  石墨板拋光.....45
圖3-21  液壓機改裝部分.....47
圖3-22  熱壓示意圖.....47
圖3-23  NdFeB薄膜附著在PMMA上.....48
圖3-24  熱壓摺疊示意圖.....48
圖3-25  PMMA/Ti/NdFeB/Ti薄膜 (a)重複熱壓摺疊 20 次(b).....50
圖3-26  感應耦合電漿質譜分析儀.....51
圖3-27  ICP-MS示意圖[73].....52
圖3-28  測針輪廓儀.....53
圖3-29  X光繞射分析儀.....54
圖3-30  高解析度場發射電子顯微鏡.....55
圖3-31  超導量子干涉磁量儀.....56
圖3-32  紫外可見分光光度計.....57
圖4-1  Ti / NdFeB(300~1200nm) / Ti薄膜退火前的晶體結構.....59
圖4-2  Ti / NdFeB(300~1200nm) / Ti薄膜退火後的晶體結構.....60
圖4-3  NdFeB(300nm)退火前的表面型態.....62
圖4-4  NdFeB(600nm)退火前的表面型態.....62
圖4-5  NdFeB(900nm)退火前的表面型態.....63
圖4-6  NdFeB(1200nm)退火前的表面型態.....63
圖4-7  NdFeB(300nm)退火後的表面型態.....64
圖4-8  NdFeB(600nm)退火後的表面型態.....64
圖4-9  NdFeB(900nm)退火後的表面型態.....65
圖4-10  NdFeB(1200nm)退火後的表面型態.....65
圖4-11  Ti / NdFeB(300nm) / Ti退火前的磁滯曲線.....68
圖4-12  Ti/NdFeB(300nm)/Ti退火後的磁滯曲線.....68
圖4-13  熱壓摺疊20次之顯微結構.....70
圖4-14  噴砂後熱壓摺疊之顯微結構.....70
圖4-15  PMMA/Ti/NdFeB(300nm)/Ti薄膜噴砂前後之透光率.....71
圖4-16  PMMA/Ti/NdFeB(300nm)/Ti薄膜在室溫下的磁滯曲線.....73
圖4-17  PMMA/Ti/ NdFeB/Ti薄膜的剩餘磁化強度曲線.....74
圖4-18  PMMA/Ti/ NdFeB/Ti薄膜的Henkel曲線.....74
 
表目錄
表2-1  Fe9Co5Al19F67和Fe13Co10Al22F55薄膜的磁化強度及透光率[21].....10
表2-2  緩衝層的厚度、退火溫度及磁性能[54].....12
表2-3  改變鐵濺鍍功率所得之釹鐵硼薄膜百分比[56].....14
表3-1  NdFeB磁鐵性能表.....31
表3-2  高密度石墨板材質證明.....32
表3-3  濺鍍參數.....40

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