本研究將開發微結構滾壓轉印製程之設備，並利用高分子光固化樹脂與可撓性透光高分子材，採取紫外光固化技術快速成型，在低溫低壓下的良好轉印特質，建立光固化之連續翻印製程。同時也開發新式的微結構母模製作方式，採用灌注的製作方式，直接在塑橡膠模帶上刻劃出表面具微米結構的軟性模帶與軟性滾輪，來取代傳統熱滾壓微結構輪。期望在滾輪成型技術中，創造新式的母模翻印方式，而能利用於光學薄膜的連續性複製成型。
    在選擇製作微結構母模的材料中，可以確定PDMS與921型矽橡膠能精準的複製微米級之表面結構，且製作成微結構母模後，也可順利翻印成型。但是製作過程，需考慮微結構輪與模帶的真圓度、真直度與表面平整性，以避免在壓印時會有壓印不均勻以及部分壓印區域光固化樹酯無法填充完全的現象產生。實驗中也探討軟性模帶與滾輪製作缺陷，對於成型的效果。在機台設計方面，發現機台壓輪機構的設計與可撓性底材的張力控制機構，直接影響成模的失真性與均勻性。上膠設備也需要作調整，否則膠體塗層的均勻直接反應在成型厚度均勻性。對於翻印成型的光學薄膜，也針對各種缺陷來探討發生原因與改善方法。並且針對微結構母模作抗沾粘處理，探討其成效。

This thesis investigates the development of imprint equipment in transferring micro-structure. By using the material of silicon based rubber, UV-curable polymer resin and the technology of UV-curing process, we can obtain a well transfer micro-structure in a continuous imprint molding process at low-pressure and low-temperature. We also develop a method for making a new type of tape-mold with micro-structure on its surface. Using the injection way, we make the micro-structure directly on the soft-rubber tape and roller, which want to substitute for the traditional hot embossing roller mold. In the Roll to Roll forming technology, we expect to develop an innovative imprinting method to apply in the continuous molding process.
    In finding the material to make the micro-structure mold, we discover that PDMS (Type 184) and silicon rubber (Type 921) can duplicate the surface structure in micro-scale perfectly because of the well fluidity before solidification. After making those materials into micro-structure tape-molds, these tape-molds can work smoothly in imprint structure. But during the process of making these elastic-molds, we need to consider the roundness, straightness and surface roughness in the micro-structure roller mold and tape mold, in order to avoid the non-uniformity in imprint process and the incomplete filling with UV-curable resin in some part of imprint area. In this investigation we discuss defects of elastic tape-mold and roller-mold that these defects probably produce during the injection and solidification process and the influence of these defects on the forming products.
    In the work of designing imprint machine using tape-mold, we find out that the design of the roller pressure control mechanism and the web tension control system influence the distortion of molding structure and the uniformity of molding products directly. The coating system also needs adjusted, or the non-uniformity of thickness in resin coating will affect the imprint products directly. For various optical film molding in different condition, we probe into the various reasons why defects produce and improvement of these defects. We also discuss the anti-sticking effect, which hope can extend the mold’s imprint times, on the imprint mold of the micro-structure.

目錄
誌謝	i 
中文摘要	ii 
英文摘要	iii 
目錄	iv 
圖目錄	vi 
表目錄	ix 

第一章 導論	1
1-1 前言	1
1-2 文獻回顧	2
1-2.1母模製作技術	3
1-2.2 軟微影技術	4
1-2.3 微熱壓成型技術	8
1-2.4 微滾壓成型技術	12
1-2.5 光固化技術	17
1-3研究目的與論文架構	22
1-3.1研究動機與目的	22
1-3.2論文架構	24
第二章 實驗設計	40
2-1 實驗材料與設備	40
2-1.1實驗材料	40
2-1.2實驗設備	41
2-2 翻印製程成型機台設計與製作	42
2-3 微結構滾輪模具設計與翻模	43
2-3.1微結構滾輪翻印概念	43
2-3.2微結構滾輪模具設計	44
2-3.3微結構滾輪翻模模具製作與組裝	44
2-3.4 PDMS與矽橡膠固化成型	45
2-4 微結構模帶模具設計與翻模	46
2-4.1微結構模帶成型概念	46
2-4.2微結構模帶模具設計與製作	47
2-4.3模帶灌注與組裝	47
2-5 抗沾粘處理	48
第三章 結果與討論	55
3-1微結構母模模具設計與製作結果	55
3-2 成型機台設計製作成果與缺失探討	57
3-3 抗沾粘處理之翻模效果	68
3-4 PDMS與矽橡膠微結構翻模	70
3-5 滾輪與模帶壓印實驗	74
3-5.1微結構滾輪之翻模	74
3-5.2微結構模帶之翻模	76
3-5.3微結構翻印缺陷討論	78
第四章 結論與未來展望	112
參考文獻	114
 
圖目錄
圖1-1 滾壓式奈米壓印微影示意圖	26
圖1-2 電子束微影製作壓印模具製程示意圖	26
圖1-3 軟微影流程示意圖	27
圖1-4 平面微觸印成型示意圖	27
圖1-5 PDMS軟模變形示意圖	28
圖1-6 複製成形法示意圖	29
圖1-7 微轉印成形法示意圖	30
圖1-8 毛細管微成形法示意圖	30
圖1-9 熱壓成型流程圖	31
圖1-10 傳統微熱壓機器示意圖	31
圖1-11 滾輪壓印製程示意圖	32
圖1-12 滾輪式奈米壓印微影示意圖	32
圖1-13 曲面應用微觸印示意圖	33
圖1-14 微觸印製作曲面微結構示意圖	33
圖1-15 微接觸印刷術滾壓示意圖	34
圖1-16 REM應用於曲面成型示意圖	34
圖1-17 熱滾壓製程示意圖	35
圖1-18 滾輪壓印於可撓式基材圖	36
圖1-19 紫外光固化壓印示意圖	37
圖1-20 紫外光固化壓印示意圖	38
圖1-21 PDMS紫外光固化壓印示意圖	38
圖1-22 後照式紫外光固化示意圖	39
圖2-1 高倍可變焦影像系統圖	53
圖2-2 PERTEX UV2000曝光機圖	53
圖2-3 翻印母模微結構示意圖	54
圖3-1 微結構滾輪翻製壓克力模具設計示意圖	84
圖3-2 微結構模帶翻製壓克力模具設計示意圖	85
圖3-3 微結構滾輪輪軸與薄殼模具設計示意圖	86
圖3-4 微結構模帶薄殼模具設計示意圖	87
圖3-5 壓克力模具成品圖	88
圖3-6 壓克力模具成品圖	88
圖3-7 母模機構組側視圖	89
圖3-8 母模機構組成品圖	90
圖3-9 滾輪機構組成品圖	91
圖3-10 馬達控制器成品圖	91
圖3-11 馬達與聯輪帶動滾軸成品示意圖	92
圖3-12 UV曝光燈與底座位置成品圖	93
圖3-13 成型機台成品圖	93
圖3-14 成型機台成品圖	94
圖3-15 PET路徑設計圖	95
圖3-16 PET路徑修改設計圖	95
圖3-17 PET路徑放料轉折角度量測圖1	96
圖3-18 PET路徑放料轉折角度量測圖2	96
圖3-19 PET路徑收料轉折角度量測圖1	97
圖3-20 PET路徑收料轉折角度量測圖2	97
圖3-21 改良後整體機台示意圖	98
圖3-22 抗沾粘處理之母模與翻模結構圖	99
圖3-23 表面接觸角量測圖	100
圖3-24 抗沾粘處理之表面接觸角量測圖	101
圖3-25 PDMS結構翻印圖	102
圖3-26 PDMS量測影像	103
圖3-27 矽橡膠結構翻印圖	104
圖3-28 矽橡膠滾輪翻印平面影像圖	105
圖3-29 PDMS矽橡膠滾輪翻印平面影像圖	106
圖3-30 矽橡膠滾輪翻印剖面影像圖	107
圖3-31 PDMS滾輪翻印剖面影像圖	108
圖3-32 矽橡膠與PDMS模帶翻印平面影像圖	109
圖3-33 矽橡膠模帶翻印剖面影像圖	110
圖3-34 PDMS模帶翻印剖面影像圖	111

表目錄
表2-1 PDMS基本性質表	50
表2-2 921型矽橡膠基本性質表	50
表2-3 871型矽橡膠基本性質表	51
表2-4 光學級PET基本性質表	51
表2-5 紫外光固化樹脂基本性質表	52
表2-6 PERTEX UV2000曝光設備基本規格表	52
表3-1 平面矽橡膠抗沾粘處理接觸角實驗結果	83

1. Stephen Y. Chou, Krauss P.R., Renstrom P.J. "Nanoimprint lithography", J. Vac. Sci. Technol. B, 14, pp. 4129-4133, 1996.
2. Heyderman, L. J., Ketterer, B., Bachle, D., Glaus, F., Haas, B., Schift, H.,Vogelsang, K., Gobrecht, J., Tiefenauer, L., Dubochet, O., Surbled, P. andHessler, T.,“High volμme fabrication of customised nanopore membranechips”, Microelectronic Engineering, Vol. 67–68, pp. 208–213 (2003).
3. Narasimhan, J. and Papautsky, I., Polymer embossing tools for rapidprototyping of plastic microfluidic devices, J. Micromech. Microeng, Vol. 14,pp. 96-103 (2004).
4. Xia Y., Whitesides, G. M. "Soft Lithography", Angew. Chem. Int. Ed., 37, pp.550-575, 1998.
5. Zhao, X.M., Xia, Y., Schueller, O.J.A., Qin, D., Whitesides, G.M., ” Fabrication of microstructures using shrinkable polystyrene films”, Sensors and Actuators A, Vol: 65,Issue: 2-3,pp. 209-217(1998)
6. Myers, D., Surfaces, Interfaces, and Colloids, VCH, New York,pp. 87-109.( 1991)
7. Arias, F., Oliver, S.R.J., Xu, B., Holmlin, R.E., Whitesides, G.M., “ Fabrication of metallic heat exchangers using sacrificial polymer mandrils”, Journal of Microelectromechanical Systems, VOL. 10, NO. 1,pp. 107-112 (2001).
8. Biebuyck, H.A. and Whitesides, G.M. “ Self-Organization of Organic Liquids on PatternedSelf-Assembled Monolayers of Alkanethiolates on Gold”, Langmuir,10, pp.2790-2793(1994)
9. Jo, B.H., Van Lerberghe, L.M., Motsegood, K.M. and Beebe, D.J., “Three-Dimensional Micro-Channel Fabrication in Polydimethylsiloxane (PDMS) Elastomer”, IEEE Journal of Microelectromechanical Systems, VOL. 9, NO. 1,pp.76-81 (2000)
10. Stephen Y. Chou, Krauss P.R., Zhang W., Guo L., Zhuang L. "Sub-10 nm imprint lithography and applications", J. Vac. Sci. Technol. B, 15, pp. 2897-2904, 1997.
11. Kee Suk Ryu , Chang Liu. "Precision Patterning of PDMS Thin Films: A New Fabrication Method and Its Applications",Sixth International Symposium on Micro Total Anlysis System (mTAS),Nara,Japan,3-7,November,2002
12. Heckele, M., Bacher, W. and Muller, K. D., “Hot embossing - the molding technique for plastic microstructures”, Microsystem Technologies, Vol. 4, pp.122-124 (1998).
13. Juang, Y.J., Lee, L.J., Koelling, K.W., “Hot Embossing in Microfabrication. PartⅠ：Experimental”,Polymer Engineering and Science, Vol.42,No.3,pp.539-550(2002).
14. L. Lin, Y. T. Cheng, C. J. Chiu, "Comparative study of hot embossed micro structures fabricated by laboratory and commercial environments", Microsystem Technologies, 4, pp.113-116, 1998.
15. Bartolini, R., Hannan, W., Karlsons, “Embossed Hologram motion pictures for television playback”Appl.Opt., Vol.9,pp.2283-2290(1970).
16. Tana, H., Gilbertson, A. and Chou, S. Y., “Roller nanoimprint lithography”, J.Vac. Sci. Technol. B, V.16, N. 6, pp. 3926-3928 (1998).
17. Xia, Y.and., Whitesides, G. M “Microcontact Printing with a Cylindrical Rolling Stamp: A Practical Step Toward Automatic Manufacturing of Patterns with Submicrometer Sized Features” Adv. Mater. 19%, 8, No. 12 pp.1015-1017(1996).
18. Gale, M. T., “Replication technique for diffractive optical elements”,Microelectronic Engineering, Vol. 34, pp. 321–329 (1997).
19. Chan-park, M. B., Neo W. K. “Ultraviolet embossing for patterning high aspect ratio polymeric microstructures”, Microsystem Technologies 9(2003)501-506.
20. Zhao, X.M., Xia Y. and Whitesides, G.M., “Fabrication of Three-Dimensional Micro-Structures ； Microtransfer Molding ”.Adv Master.,8, No. 10,pp. 837-840(1996).
21. Bender, M., Otto , M ., Vratzov, B., Spangenberg, B and Kurz, H ., “Fabrication of Nanostructures using a UV-based imprint technique” ,Microelectronic Engineering ,Vol. 53, pp. 233–236 (2000).
22. Choi, W, M., Park O. OK. “a soft-imprint technique for submicron-scale patterns using a PDMS mold” Microelectronic Engineering, Vol. 73–74, pp.178–183 (2004).
23. Liao, W.C., Chu, S.Y., Kau, P.C., “Back flash imprint lithography for transparent plastic substrates”, Microelectronic Engineering, Vol. 77, pp. 250–254 (2005).
24. Bietsch, A., Michel, B., “ Conformal contact and pattern stability of stamps used for soft lithography”, J. Appl. Phys., 88, pp.4310~4318 (2000).
25.張堯嘉，「間隙式滾輪微結構轉印製程之研究與開發」，長庚大學機械所，碩士論文，民國95年。