本論文研究以脈衝雷射鍍膜(Pulsed Laser Deposition, PLD)去成長磊晶薄膜，再利用X光繞射儀(X-ray diffractometer)跟原子力顯微鏡（Atomic force microscope, AFM）去探討材料的結晶相跟薄膜表面形貌。
  先利用了多鐵材料BiMnO3成長去了解雷射鍍膜的過程跟探討影響薄膜成長的參數。再使用了脈衝雷射-分子束磊晶系統(Laser-MBE)，配合反射式高能電子繞射儀（Reflective high energy electron diffraction），去成長和控制La2/3Ca1/3MnO3之成長面，合成YBa2Cu3O7/La2/3Ca1/3MnO3的界面，包括(i) YBa2Cu3O7的”Cu-O面”接La2/3Ca1/3MnO3的”LaCa-O面”以及(ii) YBa2Cu3O7的”Ba-O面”跟La2/3Ca1/3MnO3的”Mn-O2面” 。
 

In this study , we used pulsed laser deposition (PLD) technique to synthesize the epitaxial thin films , which were characterized using X-ray diffractometry (XRD) and Atomic force microscopy(AFM).
We first explored the effect of deposition parameters on the characteristics of Multiferroics , BiMnO3 so as to understand their correlation . We then used laser-MBE technique , in conjunction with the reflective high energy electron diffraction(RHEED) technique to synthesize YBa2Cu3O7 /La2/3Ca1/3MnO3 with specific interface.We successfully synthesized the YBCO/LCMO/SrTiO3 epitaxial thin films with two different kind of interfaces , viz (i) Cu-O(YBCO) interfaceing LaCo-O(LCMO) and (ii) Ba-O(YBCO) interfaceing Mn-O2(LCMO). 

目錄
目錄.....	4
圖表目錄........	6
第一章  緒論....	9
1.1 薄膜的形成技術......	9
1.2 薄膜的成長..	13
1.3 磊晶薄膜....	16
第二章 BiMnO3...	17
2.1 研究動機....	17
2.1.1  BiMnO3的晶體結構..       17
2.1.2  BiMnO3的物理特性..	17
2.2 實驗過程....	18
2.2.1 脈衝雷射鍍膜......	18
2.2.2 實驗步驟:.........	19
2.2.3 雷射鍍膜製程之探討........	21
2.2.4  X光繞射儀(X-ray diffractometer)..	25
2.2.5 原子力顯微鏡（atomic force microscope, AFM）......	26
2.3 數據分析....	28
2.4 結論........	40
第三章 YBa2Cu3O7/La2/3Ca1/3MnO3.	41
3.1 研究動機....	41
3.1.1 釔鋇銅氧 (YBCO)的晶體結構..	41
3.1.2 釔鋇銅氧的電荷轉移機制....	42
3.1.3 鑭鈣錳氧(La0.67Ca0.33MnO3)的晶體結構......	42
3.1.4  Double-Exchange Model....	43
3.1.5  Jahn-Teller distortion...	46
3.1.6  YBCO/LCMO 界面(interface)........	47
3.2 實驗方法....	50
3.2.2 實驗步驟..	53
3.2.3 反射式高能電子繞射儀（Reflective high energy electron diffraction）...	57
3.3 數據分析....	59
3.4 結論........	63
參考文獻........	64

 
圖表目錄
圖 1  基板表面上之成長基礎過程與核形成...	5
圖 2  薄膜成長時之表面能、界面能的關係圖........	6
圖 3  Volmer -Weber(三維核形成之成長樣式).......	6
圖 4  Frank-van der Merwe(層狀成長樣式)..	7
圖 5  Stranski-Krastanov(混合成長樣式)..	7
圖 6  BiMnO3的單位晶胞與鈣鈦礦結構BiMnO3的單位晶胞......	9
圖 7  在交大材料系朱英豪老師實驗室雷射鍍膜的設備........	13
圖 8  原子力顯微鏡......	19
圖 9  雷射能量固定在250mJ、溫度為700℃跟固定靶材跟基板的距離9cm，不同氧壓下X光繞射圖........................	21
圖 10 雷射能量固定在250mJ、溫度為700℃、固定靶材跟基板的距離9cm跟氧壓為1m torr、20 m torr的表面形貌圖.......	22
圖 11 雷射能量固定在250mJ、溫度為700℃、固定靶材跟基板的距離9cm跟氧壓為80m torr、150 m torr的表面形貌圖.....	22
圖 12 雷射能量固定在250mJ、溫度為600℃、固定靶材跟基板的距離9cm，氧壓為20m torr的X光繞射圖..................	24
圖 13 雷射能量固定在250mJ、溫度為600℃、固定靶材跟基板的距離9cm，氧壓為80m torr的X光繞射圖..................	25
圖 14 雷射能量固定在250mJ、溫度為600℃、固定靶材跟基板的距離9cm，氧壓為150m torr的X光繞射圖.................        25
圖 15 雷射能量固定在250mJ、溫度為600℃、固定靶材跟基板的距離9cm跟氧壓為20m torr、8 m torr的表面形貌圖.......	26
圖 16 雷射能量固定在250mJ、溫度為600℃、固定靶材跟基板的距離9cm跟氧壓為150 m torr的表面形貌圖...............	26
圖 17 雷射能量固定在250mJ、溫度為600℃、氧壓為80mtorr靶材跟基板的距離7cm、8cm、9cm的X光繞射圖..............	28
圖 18 雷射能量固定在250mJ、溫度為600℃、氧壓為80mtorr靶材跟基板的距離7cm、8cm、9cm的表面形貌圖.............	29
圖 19 雷射能量在250mJ、溫度為500℃、氧壓為80mtorr、靶材跟基板的距離8cm的X光繞射圖....	31
圖 20 雷射能量在250mJ、溫度為500℃、氧壓為80mtorr、靶材跟基板的距離8cm的表面形貌圖....	31
圖 21  YBCO結構..........       33
圖 22  LCMO結構.........	35
圖 23  YBCO的Cu-O面接LCMO的LaCa-O面.....	39
圖 24  YBCO的Ba-O面接LCMO的Mn-O2面......	40
圖 25  XMCD的YBCO/LCMO的界面....	41
圖 26  Laser-MBE在交大材料系朱英豪老師實驗室的示意圖....	44
圖 27  MBE的示意圖..............	44
圖 28  基板處理的流程圖.........	46
圖 29  處理好的STO(001).........	46
圖 30  脈衝雷射鍍膜的示意圖.....	48
圖 31  RHEED示意圖..............	49
圖 32  薄膜成長的RHEED..........	50
圖 33  不同成長模式的RHEED......	50
圖 34  YBCO的Ba-O接LCMO的Mn-O2示意圖....	52
圖 35  成長YBCO跟LCMO的RHEED圖......	53
圖 36  YBCO的Cu-O面接LCMO的LaCa-O示意圖.....	54
圖 37  成長SRO、YBCO跟LCMO的RHEED圖.....	54

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