論文提要內容：
本研究以非恆溫浸漬沉澱法製備薄膜應用於薄膜蒸餾中，首先以聚偏二氟乙烯(PVDF)、磷酸三乙酯(TEP)以及純水製作薄膜，並在相圖上找到一個特殊的製膜液組成，讓製膜液內的溶劑與非溶劑比例，和所使用的沉澱槽中溶劑與非溶劑之比例相同，讓沉澱槽可以重複使用，使用之沉澱槽中溫度為5°C、15°C與25°C，藉由改變沉澱槽溫度的方式來改善平板薄膜表面結構。從SEM結果得知，隨著沉澱槽中溫度的上升，其薄膜表面孔徑、孔洞數、孔隙度與接觸角皆有增加的趨勢，會使薄膜表面的緻密皮層不易形成，並探討其薄膜結構對蒸餾操作之影響。
在實驗操作，探討不同的參數對薄膜蒸餾之滲透通量及鹽阻隔率之影響，以AGMD、WGMD以及DCMD於不同進料溫度(50~80°C)、流速(0.6、0.7、0.8 L/min)與間隙高度(0、1、3 mm)進行性能探討，以及對薄膜進行回復性與耐久性之測試。最後將WGMD與DCMD進行滲透通量與產出比率(GOR)之比較，探討不同薄膜蒸餾之優缺點。
從實驗結果得出，隨著進料溫度與流速的增加、間隙高度的降低，皆可使滲透通量上升，並且WGMD的通量皆比AGMD高，而當薄膜M25使用在WGMD進料溫度為80 °C、流速0.8 L/min、間隙高度為0 mm時，可得到最高的滲透通量51.7 L/ hr。
在薄膜回復性測試中，當進料濃度為3.5 wt%和15 wt%的NaCl三種薄膜皆有良好的回復性，且在連續48小時的WGMD操作中，薄膜M25保持著穩定的滲透通量與99.99%以上的阻隔率，證明此薄膜在長時間操作下有良好的穩定性。最後在WGMD與DCMD的性能比較中，雖然DCMD的滲透通量皆高於WGMD，不過WGMD的GOR皆高於DCMD，代表WGMD在熱能的使用效率較DCMD好，因此WGMD仍具有優勢。

This work studied the preparation of the flat-sheet polyvinylidene fluoride (PVDF) membrane by non-isothermal immersion precipitation for applying in membrane distillation. The casting dope comprise PVDF, triethyl phosphate and water. In this experiment, we found a special dope composition in the phase diagram such that the solvent/non-solvent ratio in the dope was equal to that in the precipitation. As a result, the composition of the bath could be used repeatedly. In this work, the coagulation bath temperature was selected as 5°C,15°C, and 25°C. The results indicated that the pore size, porosity and contact angle of membrane became larger and the thickness of skin layer smaller as increase in coagulation bath temperature.
The second part was studied the performance of air gap membrane distillation (AGMD) , water gap membrane distillation (WGMD) and direct contact membrane distillation (DCMD) for seawater desalination. The effect of operation parameters, such as feed temperature (50-80°C), flow rate (0.6-0.8 L/min) and gap height (0, 1, 3 mm) was investigated. Finally, the advantages and the disadvantages between DCMD and WGMD was investigated by permeate flux and gained output ratio (GOR).
The results show that the flux of membrane distillation increased as the decrease in the gap height and increase the feed temperature and flow rate. The water has higher thermal conductivity than air, so the flux of WGMD is higher than AGMD. The highest flux of WGMD is 51.7 L/m2hr, when the feed temperature is 80°C, flow rate is 0.8 L/min and the gap height is 0 mm.
In the recovery experiment, both membrane have good recovery when the solution concentration of 3.5 wt% and 15 wt% NaCl. The results of long-term operation show that the flux of the M25 membrane have good stability. In the performance comparison between WGMD and DCMD, although the flux of DCMD is higher than WGMD, the GOR of WGMD is higher than DCMD, which means that WGMD is better than DCMD in energy efficiency

目錄
中文摘要	I
英文摘要	II
目錄	IV
圖目錄	VIII
表目錄	XII
第一章 緒論	1
1.1 前言	1
1.2 薄膜分離程序	3
1.3 薄膜的應用	5
1.4 薄膜蒸餾技術	6
1.5 研究動機與目的	8
第二章 文獻回顧	11
2.1 薄膜蒸餾原理與歷史發展	11
2.2 高分子薄膜製備	18
2.3 成膜理論：熱力學	19
2.4 薄膜之孔隙結構及性質	20
2.5 影響滲透通量的因素	22
2.5.1	薄膜材料	22
2.5.2	薄膜兩側蒸氣壓差	22
2.5.3	進料濃度	23
2.5.4	流速的影響	23
2.5.5	間隙的影響	24
第三章 實驗裝置與方法	26
3.1 實驗藥品	26
3.2 實驗設備	27
3.3 PVDF薄膜製備	29
3.3.1	PVDF製膜液配置	29
3.3.2	PVDF鑄膜方式	29
3.3.3	薄膜編號	29
3.4 薄膜性質分析	34
3.4.1	薄膜性質分析儀器	34
3.4.2	薄膜結構與表面孔洞分析	35
3.4.3	薄膜膜厚與孔隙度量測	35
3.4.4	薄膜接觸角量測	36
3.4.5	薄膜機械強度測試	36
3.4.6	薄膜晶體結構特性測試	36
3.5 薄膜蒸餾裝置	37
3.5.1	直接接觸式薄膜蒸餾實驗模組	37
3.5.2	間隙式薄膜蒸餾實驗模組	37
3.6 薄膜蒸餾實驗	44
3.6.1	直接接觸式薄膜蒸餾操作條件	44
3.6.2	間隙式薄膜蒸餾操作條件	44
3.6.3	薄膜蒸餾實驗步驟	45
3.7 薄膜蒸餾結果分析	48
3.7.1	滲透通量分析與計算	48
3.7.2	薄膜蒸餾產出比率分析	48
3.7.3	鹽類含量之分析方法與阻隔率計算	48
3.7.4	流量計校正	50
第四章 結果與討論	52
4.1	薄膜結構與性質分析	52
4.1.1	薄膜SEM結構分析	52
4.1.2	薄膜孔徑與孔隙度分析	57
4.1.3	薄膜接觸角分析	58
4.1.4	薄膜機械強度分析	58
4.1.5	薄膜晶體結構分析	58
4.2	間隙式薄膜蒸餾	63
4.2.1	AGMD與WGMD之滲透通量比較	63
4.2.2	薄膜於WGMD中不同操作條件探討	67
4.2.3	各薄膜於不同進料濃度之回復性探討	74
4.2.4	薄膜於長時間操作中之結果	79
4.3	直接接觸式薄膜蒸餾	81
4.4	DCMD與WGMD性能分析	84
第五章 結論	88
參考文獻	90
 
圖目錄
圖1-1 PVDF化學結構示意圖	9
圖1-2薄膜蒸餾物流動示意圖[15]	9
圖1-3不同操作程序之驅動力分類[4]	10
圖1-4 薄膜分離程序之分類[5]	10
圖2-1 DCMD、AGMD與PGMD之蒸氣傳輸機制圖[7]	16
圖2-2 AGMD與WGMD之薄膜蒸餾模組圖[35]	16
圖2-3 DCMD與AGMD之薄膜蒸餾模組圖	17
圖2-4 WGMD之薄膜蒸餾模組圖	17
圖2-5沉澱槽與製膜液之組成	25
圖2-6 高分子-溶劑-非溶劑之三相圖[61]	25
圖3-1 親水支撐層之SEM圖	30
圖3-2 親水支撐層示意圖[Precise公司]	30
圖3-3 PVDF製膜流程示意圖	31
圖3-4 DCMD模組示意圖	39
圖3-5 DCMD 壓克力模組示意圖(進料與滲透側)	40
圖3-6 AGMD與WGMD模組示意圖	41
圖3-7 AGMD與WGMD進料側壓克力模組示意圖	42
圖3-8 AGMD與WGMD冷卻側壓克力模組示意圖	43
圖3-9 直接接觸式薄膜蒸餾裝置示意圖	47
圖3-10 間隙式薄膜蒸餾裝置示意圖	47
圖3-11 氯化鈉水溶液檢量線	49
圖3-12進料側流量計校正曲線	50
圖3-13冷卻水側流量計校正曲線	51
圖4-1 5000倍薄膜上表面SEM圖	54
圖4-2 10000倍薄膜上表面SEM圖	55
圖4-3 30000倍薄膜上表面SEM圖	55
圖4-4 10000倍薄膜橫截面SEM圖	56
圖4-5 30000倍薄膜橫截面SEM圖	56
圖4-6 比較三種PVDF結晶相之XRD [59]	61
圖4-7製備不同沉澱槽溫度之PVDF薄膜XRD	62
圖4-8 薄膜於AGMD中不同間隙高度之滲透通量圖	65
圖4-9 薄膜於WGMD中不同間隙高度之滲透通量圖	66
圖4-10 M25薄膜於AGMD與WGMD之滲透通量比較圖	66
圖4-11 M25薄膜於60 oC下不同進料流量與間隙高度之通量圖	69
圖4-12 薄膜於60 oC下不同進料流量與間隙高度0 mm之通量圖	69
圖4-13 薄膜於60 oC下不同進料流量與間隙高度1 mm之通量圖	70
圖4-14 薄膜於60 oC下不同進料流量與間隙高度3 mm之通量圖	70
圖4-15 M25薄膜於間隙高度0 mm中不同進料溫度與流量之通量圖	71
圖4-17 薄膜於間隙高度0 mm以及60 oC下不同進料流量之通量圖	72
圖4-19 薄膜於間隙高度0 mm以及80 oC下不同進料流量之通量圖	73
圖4-20 薄膜於WGMD中進料3.5 wt%鹽水前後之純水通量圖	76
圖4-21 薄膜於WGMD中進料15 wt%鹽水前後之純水通量圖	77
圖4-22 M25薄膜於WGMD中不同進料鹽水前後之純水通量圖	77
圖4-23 薄膜於DCMD中進料3.5 wt%鹽水前後之純水通量圖	78
圖4-24 薄膜於DCMD中進料15 wt%鹽水前後之純水通量圖	78
圖4-25 M25薄膜於DCMD中不同進料鹽水前後之純水通量圖	79
圖4-26 M25薄膜於WGMD中操作48小時之滲透通量與導電度圖	80
圖4-27薄膜於60 oC下不同進料流量之通量圖	83
圖4-28薄膜於固定流速0.6 L/min不同進料溫度之通量圖	83
圖4-29 DCMD與WGMD於50 oC不同薄膜下的滲透通量與GOR比較圖	85
圖4-30 DCMD與WGMD於60oC不同薄膜下的滲透通量與GOR比較圖	86
圖4-31 DCMD與WGMD於70oC不同薄膜下的滲透通量與GOR比較圖	86
圖4-32 DCMD與WGMD於80oC不同薄膜下的滲透通量與GOR比較圖	87


 
表目錄
表3-1 親水支撐層性質表	32
表3-2 薄膜製備條件表	32
表3-3 薄膜編號表	33
表4-1 薄膜性質分析表	60
表4-2 薄膜拉伸強度分析表	60
表4-3 薄膜於DCMD及WGMD不同溫度下之GOR	87

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