本論文研究以偏壓輔助微波電漿化學氣相沈積法（MPECVD），在矽的基板上所合成的P型與N型半導化的奈米鑽石薄膜。 X光吸收近邊緣結構（X-ray Absorption Near Edge Structure)，對奈米鑽石薄膜之鍵結與電子結構來做分析，並找出摻雜元素在奈米鑽石膜中所造成的的影響。
    我們發現在微米鑽石系列與奈米鑽石系列，在掺雜氮(或硼)時，sp2與sp3變化會因晶粒尺寸改變，此現象對應到場發射特性上，可以推測微米鑽石系列與奈米鑽石系列掺雜機制不同，場發射改善的原因也不同，在此論文中我們將深入討論。

Nitrogen- and Boron-doped Nanocrystalline Diamond (NCD) Thin Films were deposited on silicon substrate using a Microwave plasma-enhanced chemical vapor deposition (MPECVD) method. X-ray absorption near-edge structure (XANES), measurements have been performed chemical structure and bonding configuration for a variety of Nitrogen- doped、Boron-doped and undoped Nanocrystalline diamond Thin films.
    We find that sp2 and sp3 in microcrystalline diamond series and 
Nanocrystalline diamond series are different, when the grain size is reducing. The phenomenon is corresponding to the field emission properties. We suggest that doping in MCD and NCD have different mechanism. We will discuss in this paper.

致謝………………………………………………………………I
中文摘要…………………………………………………………II
英文摘要…………………………………………………………III
目錄………………………………………………………………IV
圖表目錄…………………………………………………………VI
第一章	緒論…………………………………………………1
1-1	簡介…………………………………………………1
1-2	鑽石的特性…………………………………………3
1-2.1   碳的結構……………………………………………3
1-2.2   鑽石的特色…………………………………………5
1-2.3   鑽石的負電子親和力………………………………6
1-2.4   半導體鑽石…………………………………………7
1-2.5   奈米鑽石…..………………………………………10
1-3	鑽石薄膜製造原理與應用………………………11
第二章	X光吸收譜簡介……………………………………12
2-1	X光吸收近邊緣結構(XANES)……………………16
2-2	數據分析…………………………………………19
第三章	實驗設備與量測方法……………………………24
3-1	X光光源……………………………………………24
3-2	單色儀(monochromator)…………………………26
3-3	光譜測量方式……………………………………29
3-4	樣品提供與實驗設備……………………………32
第四章	實驗結果分析……………………………………34
           X光吸收光譜近邊緣結構 (XANES)…………34
第五章	結論………………………………………………55
參考文獻……………………………………………………56

圖表目錄
圖1-1 鑚石結晶型態………………………………………………4
圖1-2 石墨結晶型態………………………………………………4
圖1-3 掺硼(I)與掺氮(II)之場發射效果比較……………………...9
圖2-1 物質吸收截面與能量之關係圖…………………………….14
圖2-2 XANES 與EXAFS 分界圖………………………………….15
圖2-3 光電子平均自由路徑與能量關係………………………….17
圖2-4 單一散射與多重散射之圖示……………………………….17
圖2-5 吸收光譜與電子末態關係示意圖………………………….18
圖2-6 X 光吸收光譜之數據分析流程…………………………….19
圖2-7 選擇能量底限E0 值的不同方法……………………………21
圖3-1 X 光吸收光譜實驗示意圖………………………………....27
圖3-2 穿透式………………………………………………………..28
圖3-3 X 光通過物質之強度衰減…………………………………...28
圖3-4 螢光式………………………………………………………..29
圖3-5 電子逸出式…………………………………………………..30
圖3-6 光子吸收過程………………………………………………..31
圖 4-1 歸一化後鑽石薄膜C K-edge 光譜圖…………………….35
圖 4-2 未摻雜系列鑽石薄膜C K-edge 光譜圖…………………37
圖 4-3 摻雜氮系列鑽石薄膜C K-edge 光譜圖…………………..38
圖 4-4 摻雜硼系列鑽石薄膜C K-edge 光譜圖…………………..39
圖4-5 MCD 系列鑽石薄膜C K-edge 光譜圖……………………..41
圖4-6 Sub-mircon size 系列鑽石薄膜C K-edge 光譜圖……..43
圖4-7 NCD 系列鑽石薄膜C K-edge 光譜圖………..………...….44
圖4-8 在sp2 部分取一適當高斯函數為背景……….…………....47
圖4-9 在sp3 部分其前後各取一適當高斯函數為背景…....…….47
圖4-10 未摻雜系列扣除適當高斯函數之sp2………………..…......48
圖4-11 摻雜氮系列扣除適當高斯函數之sp2…………………..…..48
圖4-12 摻雜硼系列扣除適當高斯函數之sp2…………………..…..49
圖4-13 MCD 系列扣除適當高斯函數之sp2…………………........49
圖4-14 Sub-MCD 系列扣除適當高斯函數sp2…………………….50
圖4-15 NCD 系列扣除適當高斯函數之sp2………………………..50
圖4-16 分別對尺寸變化其(a) sp2；(b) sp3 空軌域面積作積分後之積
值..............................................................................................................52
圖4-17 分別對未掺雜、氮掺雜與硼掺雜其(a) sp2；(b) sp3 空軌域面
積作積分後之積分值…………………………......................................53
表1-1 天然鑽石、鑽石膜及類鑽石膜之特性質比較………………..2
表3-1 樣品清單………………………………………………………32

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