現今社會3D建模技術越來越廣泛應用，也成為時下流行的趨勢，例如3D列印表機可以透過三維掃描儀得到三維資訊列印出來並加以應用等等。本論文以條紋投影輪廓儀(Projection Fringe Profilometry，簡稱PFP)為應用，此優點在於非接觸式測量，可避免碰觸物體導致物體受損，再來操作時間短，架設方便，可即時取得三維資訊。但在過去的研究中發現，所得到的條紋圖像背景有顆粒狀的光斑成隨機分布，因此本論文主題著重在後端演算裡增加消除雜訊演算法來降低雜訊，在進行相位展開之前，選用改良版中值濾波，針對截斷線上做紋理分析，保留住該有特性，並在相位展開之後加入對數螺線演算法消除雜訊，使還原結果更接近原始深度資訊，最後用RMSE比較結果。

3D modeling technology is widely used in decades, the applications including the most popular 3D printing that prints out the object scanned by a 3D scanner. This research work employs the fringe projection techniques to construct the 3D model. The fringe projection technique has the advantages of non-contact measurement to avoid touching objects that may damage the objects and fast operation time. However the fringe image may have random distributed granular spots (noise). This research work tries to reduce the noise caused by the fringe projection techniques when constructing a 3D object. First, this research uses a median filter to filter out some noises, which can preserve the characteristics of the phase wrapped map before the procedure of phase unwrapping. To eliminate the noise further, after phase unwrapping we apply our proposed logarithmic spiral algorithm to the unwrapped figure. Our approach can make the reconstructed 3D figure much better than that reconstructed by other approaches.

目錄
致謝 I
中文摘要 II
英文摘要 III
目錄 IV
圖目錄 VI
表目錄 IX
第一章緒論 1
1.1  研究背景與動機1
1-2 論文架構3
第二章條紋投影技術 4
2.1條紋投影技術簡介 4
2.2 條紋投影輪廓儀架構7
2.3 相位移技術8
2.3.1 四步相位移法 8
2.4 相位展開11
2.4.1  路徑相依型相位展開 11 
2.4.2路徑獨立型相位展開12
2.5 光學三角量測法 13
2.6 條紋投影雜訊探討15
第三章研究方法 17
3.1 相位分析18
3.2 相位展開19
3.3中值濾波 19
3.5對數螺線演算法 20
第四章模擬與實驗 22
4.1中值濾波探討 23
4.2 對數螺線遮罩探討25
4.3 實驗結果32
4.3.1 比較結果模擬圖 32
4.3.2 剖面圖分析 35
4.3.3 展示3D圖39
第五章結論與未來展望42
參考文獻 43

圖目錄
圖1.1 3D列印2
圖1.2 條紋投影示意圖3
圖2.1 條紋投影系統流程圖6
圖2.2 條紋投影輪廓儀7
圖2.3.a待測物條紋變形影像10
圖2.3.b參考平面條紋影像10
圖2.4包裹相位圖 10
圖2.5 π落差包裹圖11
圖2.6 路徑相依型 12
圖2.7 權重Mask 13
圖2.8 光學三角量測法15
圖2.9 光斑產生過程 16
圖3.1 本論文所提出的系統流程圖18
圖3.2 對數螺線流程圖21
圖4.1 半圓立體圖22
圖4.2 凹凸曲面圖23
圖4.3 濾波次數之比較244 
圖4.4 3*3 Mask 26
圖4.5 5*5 Mask 26
圖4.6 7*7 Mask 27
圖4.7 9*9 Mask 27
圖4.8 11*11 Mask 28
圖4.9 13*13 Mask 28
圖4.10 3*3 Mask 29
圖4.11 5*5 Mask 29
圖4.12 7*7 Mask 30
圖4.13 9*9 Mask 30
圖4.14 11*11 Mask 31
圖4.15 13*13 Mask 31
圖4.16 Pattern 1濾波結果圖(a) 本文提出之方法(b) 文獻[25] 濾波方法(c) 文獻[26] 濾波方法(d) 無做任何雜訊處理 33
圖4.17 Pattern 2 濾波結果圖(a) 本文提出之方法(b)文獻[25] 濾波方法(c) 文獻[26] 濾波方法(d) 無做任何雜訊處理 34
圖4.18 Pattern 1剖面圖35
圖4.19 Pattern 1局部放大剖面圖(a) 邊緣情形(b) 頂部情形36
圖4.21 Pattern 2局部放大剖面圖(a) 底部和右側邊緣情形(b) 頂部情形 38
圖4.22 經過濾雜訊39
圖4.23 未經過濾雜訊40
圖4.24 原始圖40
圖4.25經過濾雜訊 41
圖4.26未經過濾雜訊 41
圖4.27 原始圖41

表目錄
表4.1不同次數之情況 24
表4.2 不同遮罩情況下結果25
表4.3 實驗結果32

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